Patterning of Lead Halide Perovskite Device Stacks on CMOS Readout Using Selective Microfabrication Protocols

Journal:
Advanced Materials
Published:
DOI:
10.1002/adma.202523002
Affiliations:
5
Authors:
15
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Institutions Authors Share
Swiss Federal Institute of Technology Zurich (ETH Zurich), Switzerland
9.000000
 0.60
Swiss Federal Laboratories for Materials Science and Technology (EMPA), Switzerland
6.000000
 0.40
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