Orthogonal Monomer Design Enables Sequentially Cured Hybrid Polymers for Ultralow-Dielectric Applications

Journal:: Advanced Materials
Published:: 2026-04-27
DOI:: 10.1002/adma.202600007
Affiliations:: 2
Authors:: 7

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Institutions	Authors	Share
Institute of Chemistry (ICCAS), CAS, China	3.500000	0.50
University of Chinese Academy of Sciences (UCAS), China	3.500000	0.50

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