(Liquid) Metallic Photoresist for Monolithic Microlithography of Elastic Electronics

Journal:

Advanced Materials

Published:

2026-01-19

DOI:

10.1002/adma.72140

Affiliations:

3

Authors:

11

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Institutions	Authors	Share
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, China	5.000000	0.45
Beijing Advanced Innovation Center for Integrated Circuits, China	5.000000	0.45
MOE Key Laboratory of Polymer Chemistry and Physics, PKU, China	1.000000	0.09

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