Reconciling High-κ and Wide-Bandgap Dielectrics (TbOCl) with Intrinsic Stability in 2D Electronics

Journal:

Advanced Materials

Published:

2026-05-16

DOI:

10.1002/adma.73420

Affiliations:

3

Authors:

10

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Institutions	Authors	Share
Hefei University of Technology (HFUT), China	7.000000	0.70
State Key Laboratory of Material Processing and Die and Mould Technology, HUST, China	2.500000	0.25
Huazhong University of Science and Technology (HUST), China	0.500000	0.05

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