Interplay Between Stereochemically Active Lone Pair Repulsions, Sigma Hole Interactions, and Delocalized Redox Processes in Topochemical Fluoride‐Ion Insertion

Journal:

Angewandte Chemie International Edition

Published:

2025-06-23

DOI:

10.1002/anie.202507650

Affiliations:

5

Authors:

9

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Institutions	Authors	Share
Texas A&M University (TAMU), United States of America (USA)	4.333333	0.48
Material Measurement Laboratory (MML), NIST, United States of America (USA)	3.000000	0.33
Brookhaven National Laboratory (BNL), United States of America (USA)	1.000000	0.11
Swiss Federal Institute of Technology Zurich (ETH Zurich), Switzerland	0.333333	0.04
Paul Scherrer Institute (PSI), Switzerland	0.333333	0.04

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