Plasma‐Engineered Sub‐10 nm Surface Fluorination Enables Ultraselective Hollow Fiber Membranes

Journal:
Angewandte Chemie International Edition
Published:
DOI:
10.1002/anie.202512119
Affiliations:
4
Authors:
7
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Institutions Authors Share
Institute of Process Engineering (IPE), CAS, China
5.833333
 0.83
Henan University (HENU), China
0.500000
 0.07
University of Science and Technology of China (USTC), China
0.333333
 0.05
Heze University, China
0.333333
 0.05
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