Sustainable Fluorinated Silicon Dielectric Design for Enhanced Contact‐Electro‐Chemistry

Journal:

Angewandte Chemie International Edition

Published:

2025-09-18

DOI:

10.1002/anie.202517059

Affiliations:

7

Authors:

7

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Institutions	Authors	Share
Shaanxi University of Science and Technology (SUST), China	2.500000	0.36
Beijing Institute of Nanoenergy and Nanosystems (BINN), CAS, China	2.500000	0.36
University of Cambridge, United Kingdom (UK)	0.833333	0.12
University of Chinese Academy of Sciences (UCAS), China	0.500000	0.07
ZJU-UIUC Institute, China	0.333333	0.05
Shenzhen Polytechnic University (SZPU), China	0.333333	0.05

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