Bis(2-amino-5-thienyl)Ketone as Oxygen Tolerant Sensitizer for Conventional Radical Photopolymerization

Journal:

Angewandte Chemie International Edition

Published:

2025-12-16

DOI:

10.1002/anie.202518608

Affiliations:

5

Authors:

8

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Institutions	Authors	Share
Hochschule Niederrhein University of Applied Science, Germany	4.000000	0.50
Laboratory of Photochemistry and Macromolecular Engineering (LPIM), UHA, France	1.000000	0.13
University of Duisburg-Essen (UDE), Germany	1.000000	0.13
Leibniz Institute for Solid State and Materials Research (IFW Dresden), Germany	1.000000	0.13
TU Dresden, Germany	1.000000	0.13

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