Atomically Precise Interfacial Engineering on Tin-Silicon Oxo Clusters for Sub-8 nm Lithography

Journal:

Angewandte Chemie International Edition

Published:

2026-02-02

DOI:

10.1002/anie.202524320

Affiliations:

3

Authors:

11

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Institutions	Authors	Share
Tianjin Key Laboratory of Micro-Scale Optical Information Science and Technology, NKU, China	8.000000	0.73
Nankai University (NKU), China	2.000000	0.18
Shanghai Advanced Research Institute (SARI), CAS, China	1.000000	0.09

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