Photoinduced Generation of (Boryl)Silyl and (Chloro)Silyl Radicals: Access to Trisubstituted Silylboranes and Chlorosilanes
- Journal:
- Angewandte Chemie International Edition
- Published:
- DOI:
- 10.1002/anie.6372902
- Affiliations:
- 3
- Authors:
- 2
| Institutions | Authors | Share |
|---|---|---|
| Institute of Science Tokyo (Science Tokyo), Japan | 0.50 | |
| The University of Tokyo (UTokyo), Japan | 0.50 | |
| Japan Science and Technology Agency (JST), Japan | 0.00 |