Developmental Toxicity of Photolithography-Relevant Per- and Polyfluoroalkyl Substances (PFAS) Reveals Concerns for Less-Studied Functional Groups

Journal:
Environmental Science and Technology
Published:
DOI:
10.1021/acs.est.5c09577
Affiliations:
5
Authors:
8
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Institutions Authors Share
University of Pittsburgh (Pitt), United States of America (USA)
6.000000
 0.75
IBM, United States of America (USA)
1.000000
 0.13
Beijing Normal University (BNU), China
1.000000
 0.13
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