Trinuclear Tin Complexes for Advanced Lithography: Sensitivity Enhancement via the Synergistic Effect in Dual Cross-Linking Systems

Journal:
Inorganic Chemistry
Published:
DOI:
10.1021/acs.inorgchem.5c00501
Affiliations:
3
Authors:
13
Institutions Authors Share
State Key Laboratory of Fine Chemicals, DUT, China
11.500000
11.500000
0.88
Shanghai Synchrotron Radiation Facility (SSRF), SARI CAS, China
1.000000
0.08
Shenzhen University (SZU), China
0.500000
0.04