Trinuclear Tin Complexes for Advanced Lithography: Sensitivity Enhancement via the Synergistic Effect in Dual Cross-Linking Systems
- Journal:
- Inorganic Chemistry
- Published:
- DOI:
- 10.1021/acs.inorgchem.5c00501
- Affiliations:
- 3
- Authors:
- 13
| Institutions | Authors | Share |
|---|---|---|
| State Key Laboratory of Fine Chemicals, DUT, China | 0.88 | |
| Shanghai Synchrotron Radiation Facility (SSRF), SARI CAS, China | 0.08 | |
| Shenzhen University (SZU), China | 0.04 |