Ligand Regulation and Mechanism Study of Organotin Carboxylate Resists in DUV Lithography

Journal:

Inorganic Chemistry

Published:

2026-02-19

DOI:

10.1021/acs.inorgchem.5c05912

Affiliations:

5

Authors:

11

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Institutions	Authors	Share
National Key Laboratory of Optical Filed Manipulation Science and Technology, IOE CAS, China	6.000000	0.55
Sichuan University (SCU), China	2.500000	0.23
University of Electronic Science and Technology of China (UESTC), China	1.500000	0.14
Xi'an Jiaotong University (XJTU), China	0.500000	0.05
State Key Laboratory for Manufacturing System Engineering (SKLMS), XJTU, China	0.500000	0.05

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