Amorphous Silicon Nitride Thin Film Withstanding Up to 1700 °C: Structure and Thermal Conductivity
- Journal:
- The Journal of Physical Chemistry Letters
- Published:
- DOI:
- 10.1021/acs.jpclett.5c01552
- Affiliations:
- 3
- Authors:
- 4
| Institutions | Authors | Share |
|---|---|---|
| Beijing Institute of Nanoenergy and Nanosystems (BINN), CAS, China | 0.42 | |
| University of Chinese Academy of Sciences (UCAS), China | 0.42 | |
| Beijing University of Chemical Technology (BUCT), China | 0.17 |