Stoichiometry-Induced Band Gap Opening in Epitaxial Degenerate Copper Sulfide Thin Films

Journal:
The Journal of Physical Chemistry Letters
Published:
Affiliations:
8
Authors:
16
Institutions Authors Share
Cardiff University, United Kingdom (UK)
8.000000
0.50
National Physical Laboratory (NPL), United Kingdom (UK)
2.000000
0.13
MOE Key Laboratory for Special Functional Materials, HENU, China
2.000000
0.13
Italian Institute of Technology (IIT), Italy
1.500000
0.09
The University of Sheffield, United Kingdom (UK)
1.000000
0.06
Huawei Technologies Research and Development Belgium, Belgium
1.000000
0.06
University of Genova, Italy
0.500000
0.03