Compliant Nanomembranes Enable a Crack-Free Heteroepitaxial Film with a Steep Metal–Insulator Transition beyond the Critical Thickness

Journal:
Nano Letters
Published:
DOI:
10.1021/acs.nanolett.5c01392
Affiliations:
5
Authors:
5
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Institutions Authors Share
Seoul National University (SNU), South Korea
2.666667
 0.53
Pohang University of Science and Technology (POSTECH), South Korea
2.000000
 0.40
University of Minnesota (UMN), United States of America (USA)
0.333333
 0.07
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