Gate-Tunable Band Edge in Few-Layer MoS2

Journal:
Nano Letters
Published:
DOI:
10.1021/acs.nanolett.5c01998
Affiliations:
6
Authors:
12
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Institutions Authors Share
Swiss Federal Institute of Technology Zurich (ETH Zurich), Switzerland
5.000000
 0.42
The University of Manchester (UoM), United Kingdom (UK)
5.000000
 0.42
WPI International Center for Materials Nanoarchitectonics (WPI-MANA), NIMS, Japan
1.000000
 0.08
Research Center for Electronic and Optical Materials, NIMS, Japan
1.000000
 0.08
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