Removing the Critical Thickness of Improper Ferroelectrics via Interfacial Reconstruction

Journal:

Nano Letters

Published:

2025-08-20

DOI:

10.1021/acs.nanolett.5c02517

Affiliations:

5

Authors:

7

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Institutions	Authors	Share
University of Nebraska-Lincoln (UNL), United States of America (USA)	3.500000	0.50
Washington University in St. Louis (WUSTL), United States of America (USA)	3.000000	0.43
Drexel University, United States of America (USA)	0.500000	0.07

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