Engineering Ge Profiles in Si/SiGe Heterostructures for Increased Valley Splitting

Journal:

Nano Letters

Published:

2025-08-12

DOI:

10.1021/acs.nanolett.5c02848

Affiliations:

4

Authors:

9

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Institutions	Authors	Share
Delft University of Technology (TU Delft), Netherlands	5.000000	0.56
University of Wisconsin-Madison (UW-Madison), United States of America (USA)	2.000000	0.22
Catalan Institute of Nanoscience and Nanotechnology (ICN2), BIST, Spain	1.500000	0.17
Catalan Institution for Research and Advanced Studies (ICREA), Spain	0.500000	0.06

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