Gate-Tunable Electroresistance in a Sliding Ferroelectric Tunnel Junction

Journal:
Nano Letters
Published:
DOI:
10.1021/acs.nanolett.5c03367
Affiliations:
5
Authors:
6
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Institutions Authors Share
Cornell University, United States of America (USA)
3.500000
 0.58
WPI International Center for Materials Nanoarchitectonics (WPI-MANA), NIMS, Japan
1.000000
 0.17
Research Center for Electronic and Optical Materials, NIMS, Japan
1.000000
 0.17
Kavli Institute at Cornell for Nanoscale Science, United States of America (USA)
0.500000
 0.08
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