Nanoscale Dynamics of Buried Charge Trap in Oxide-Nitride-Oxide Stacks Investigated Using Kelvin Probe Force Microscopy

Journal:
Nano Letters
Published:
DOI:
10.1021/acs.nanolett.5c03652
Affiliations:
2
Authors:
9
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Institutions Authors Share
Samsung Advanced Institute of Technology (SAIT), South Korea
5.000000
 0.56
Korea Advanced Institute of Science and Technology (KAIST), South Korea
4.000000
 0.44
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