Persistent Ferroelectric Retention of Ferroelectric BiFeO3 Thin Films

Journal:
Nano Letters
Published:
DOI:
10.1021/acs.nanolett.5c04334
Affiliations:
5
Authors:
10
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Institutions Authors Share
Fourth Military Medical University (FMMU), China
4.000000
 0.40
Xidian University, China
3.500000
 0.35
Beijing Normal University (BNU), China
2.000000
 0.20
University of Science and Technology Beijing (USTB), China
0.500000
 0.05
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