Interfacial Engineering toward Ultralow Thermal Boundary Resistance at Metal–Semiconductor Contacts

Journal:
Nano Letters
Published:
DOI:
10.1021/acs.nanolett.5c05501
Affiliations:
5
Authors:
9
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Institutions Authors Share
Fudan University, China
5.000000
 0.56
State Key Laboratory of Optoelectronic Materials and Technologies (OEMT), SYSU, China
2.000000
 0.22
Research Center for Electronic and Optical Materials, NIMS, Japan
1.000000
 0.11
State Key Laboratory for Artificial Microstructure and Mesoscopic Physics, PKU, China
1.000000
 0.11
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