Self-Intercalation Metallization Enables Low-Resistance Contacts in ZrSe2 and HfSe2

Journal:

Nano Letters

Published:

2026-02-15

DOI:

10.1021/acs.nanolett.5c06220

Affiliations:

2

Authors:

11

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Institutions	Authors	Share
State Key Laboratory of Material Processing and Die and Mould Technology, HUST, China	5.500000	0.50
Huazhong University of Science and Technology (HUST), China	5.500000	0.50

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