Passivating Interfacial Pore Defects with Light Atoms To Enhance Heat Transport Across Cu/a-SiO2 Interfaces

Journal:
Nano Letters
Published:
DOI:
10.1021/acs.nanolett.5c06478
Affiliations:
2
Authors:
5
Go to article
Institutions Authors Share
Peking University (PKU), China
4.500000
 0.90
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, China
0.500000
 0.10
Interested in Electronics, Sensors and Digital Hardware?