Epitaxial Formation of Ultrathin HfO2 on Multilayer Graphene by Sequential Oxidation

Journal:
ACS Nano
Published:
DOI:
10.1021/acsnano.5c04437
Affiliations:
2
Authors:
9
Institutions Authors Share
Massachusetts Institute of Technology (MIT), United States of America (USA)
7.000000
0.78
The Pennsylvania State University (Penn State), United States of America (USA)
2.000000
0.22