Vertical Stacking of Atomic-Layer-Deposited Oxide Layers via a Fluorinated Graphene Transfer Technique

Journal:

ACS Nano

Published:

2025-07-01

DOI:

10.1021/acsnano.5c04669

Affiliations:

4

Authors:

10

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Institutions	Authors	Share
Seoul National University (SNU), South Korea	9.000000	0.90
Korea Institute of Science and Technology (KIST), South Korea	0.333333	0.03
Department of JBNU-KIST Industry-Academia Convergence Research, South Korea	0.333333	0.03
KIST School, UST, South Korea	0.333333	0.03

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