Electroforming Kinetics in HfOsubix/i/sub/Ti RRAM: Mechanisms behind Compositional and Thermal Engineering

Journal:
ACS Nano
Published:
DOI:
10.1021/acsnano.5c05850
Affiliations:
2
Authors:
9
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Institutions Authors Share
Swiss Federal Institute of Technology Zurich (ETH Zurich), Switzerland
6.000000
 0.67
IBM Research - Zurich, Switzerland
3.000000
 0.33
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