Enhanced Reliability of Ultra-Scaled Interconnects Using Interlayer-Doped Aligned Carbon Nanotube–Metal Composites

Journal:
ACS Nano
Published:
DOI:
10.1021/acsnano.5c06105
Affiliations:
3
Authors:
7
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Institutions Authors Share
Kyung Hee University (KHU), South Korea
4.000000
 0.57
Samsung Advanced Institute of Technology (SAIT), South Korea
3.000000
 0.43
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