Norbornene and Epoxide-Substituted Silsesquioxane Photoresists with High-Sensitivity and Stability

Journal:

ACS Nano

Published:

2025-10-28

DOI:

10.1021/acsnano.5c06472

Affiliations:

4

Authors:

7

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Institutions	Authors	Share
MOE Key Laboratory of Macromolecular Synthesis and Functionalization, ZJU, China	3.000000	0.43
MOE Key Laboratory of Organosilicon Chemistry and Material Technology, HZNU, China	2.000000	0.29
Zhejiang University (ZJU), China	1.000000	0.14
Nankai University (NKU), China	1.000000	0.14

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