Scalable Integration of Single-Crystalline Ag Nanosheets for Threshold Voltage Engineering in Oxide Thin-Film Transistors

Journal:

ACS Nano

Published:

2025-11-13

DOI:

10.1021/acsnano.5c13526

Affiliations:

8

Authors:

14

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Institutions	Authors	Share
LANL-JBNU Engineering Institute Korea, South Korea	5.500000	0.39
Ajou University (AJOU), South Korea	2.000000	0.14
Korea Institute of Science and Technology (KIST), South Korea	2.000000	0.14
Department of JBNU-KIST Industry-Academia Convergence Research, South Korea	1.500000	0.11
Max Planck Institute of Microstructure Physics (MPI-MSP), Germany	1.000000	0.07
Pusan National University (PNU), South Korea	1.000000	0.07
Korea Electric Power Corporation (KEPCO), South Korea	1.000000	0.07

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