Hf/Zr Superlattice-Based High-κ Gate Dielectrics with Dipole Layer Engineering for Advanced CMOS
- Journal:
- ACS Nano
- Published:
- DOI:
- 10.1021/acsnano.5c15062
- Affiliations:
- 3
- Authors:
- 10
| Institutions | Authors | Share |
|---|---|---|
| Georgia Institute of Technology (Georgia Tech), United States of America (USA) | 0.75 | |
| Sungkyunkwan University (SKKU), South Korea | 0.15 | |
| Korea University, South Korea | 0.10 |