Wafer-Scale Monolayer MoS2 with Tunable Grain Size via Grain Boundary Engineering for Neuromorphic Computing

Journal:

ACS Nano

Published:

2025-11-24

DOI:

10.1021/acsnano.5c17643

Affiliations:

7

Authors:

12

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Institutions	Authors	Share
Institute of Materials Research and Engineering (IMRE), A*STAR, Singapore	4.000000	0.33
National University of Singapore (NUS), Singapore	3.000000	0.25
Max Planck–NTU Joint Lab for Artificial Senses, Singapore	2.000000	0.17
Institute of Microelectronics (IME), CAS, China	1.000000	0.08
University of Chinese Academy of Sciences (UCAS), China	1.000000	0.08
Southeast University (SEU), China	1.000000	0.08

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