Ultrathin Amorphous p-Type Tellurium Oxide Films Enabled by Cryogenic Deposition

Journal:

ACS Nano

Published:

2026-02-17

DOI:

10.1021/acsnano.5c19884

Affiliations:

6

Authors:

11

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Institutions	Authors	Share
Lawrence Berkeley National Laboratory (LBNL), United States of America (USA)	5.083333	0.46
University of California, Berkeley (UC Berkeley), United States of America (USA)	4.666667	0.42
TSMC North America, United States of America (USA)	1.000000	0.09
Kavli Energy NanoSciences Institute at Berkeley, United States of America (USA)	0.250000	0.02

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