Surface Passivation for Halide Optoelectronics: Comparing Optimization and Reactivity of Amino-Silanes with Formamidinium

Journal:

Journal of the American Chemical Society

Published:

2025-11-07

DOI:

10.1021/jacs.5c15574

Affiliations:

3

Authors:

6

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Institutions	Authors	Share
University of Washington (UW), United States of America (USA)	3.000000	0.50
Renewable and Sustainable Energy Institute (RASEI), United States of America (USA)	2.500000	0.42
University of Colorado Boulder (CU-Boulder), United States of America (USA)	0.500000	0.08

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