Coexistence of Ohmic Contact and Fermi Level Pinning at 2D Electride/2D Semiconductor Interfaces
- Journal:
- Journal of the American Chemical Society
- Published:
- DOI:
- 10.1021/jacs.5c18589
- Affiliations:
- 3
- Authors:
- 5
| Institutions | Authors | Share |
|---|---|---|
| MOE Key Laboratory of Polar Materials and Devices, ECNU, China | 0.60 | |
| Chongqing University (CQU), China | 0.20 | |
| Nanjing University of Posts and Telecommunications (NUPT), China | 0.20 |