Surface Halogen Passivation Enables Ultra-Stable Metal Sulfide for Efficient Methanol Photoactivation

Journal:

Journal of the American Chemical Society

Published:

2026-02-10

DOI:

10.1021/jacs.5c19863

Affiliations:

3

Authors:

9

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Institutions	Authors	Share
Hefei National Laboratory for Physical Sciences at the Microscale (HFNL), USTC, China	6.500000	0.72
Shenzhen Technology University (SZTU), China	2.000000	0.22
State Key Laboratory of Precision and Intelligent Chemistry, USTC, China	0.500000	0.06

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