Shallow Hole Trapping and Intrinsic Defect Tolerance in Visible-Light Photocatalysts: The Role of Lattice Relaxation and Electronic Screening

Journal:
Journal of the American Chemical Society
Published:
DOI:
10.1021/jacs.6c00026
Affiliations:
3
Authors:
3
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Institutions Authors Share
Shinshu University (SU), Japan
2.000000
 0.67
Okayama University, Japan
0.500000
 0.17
The University of Tokyo (UTokyo), Japan
0.500000
 0.17
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