A stable monoclinic variant and resultant robust ferroelectricity in single-crystalline hafnia-based films

Journal:

Nature Communications

Published:

2025-10-03

DOI:

10.1038/s41467-025-63907-z

Affiliations:

7

Authors:

8

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Institutions	Authors	Share
Shenyang National Laboratory for Materials Science (SYNL), IMR CAS, China	2.000000	0.25
Zhejiang Laboratory, China	2.000000	0.25
CAS Songshan Lake Materials Laboratory, China	1.833333	0.23
Xidian University, China	1.000000	0.13
Hunan University of Science and Technology (HNUST), China	0.500000	0.06
Institute of Physics (IOP), CAS, China	0.333333	0.04
Southern University of Science and Technology (SUSTech), China	0.333333	0.04

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