Enhancing the ORR durability of single atomic Fe-N4 active sites with implanted SiO2 nanoparticles as radical and H2O2 inhibitors

Journal:

Nature Communications

Published:

2025-11-19

DOI:

10.1038/s41467-025-65194-0

Affiliations:

7

Authors:

15

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Institutions	Authors	Share
Jiangsu University (JSU), China	7.500000	0.50
Jiangsu Cnano Technology, China	2.000000	0.13
Institute of Materials Research and Engineering (IMRE), A*STAR, Singapore	2.000000	0.13
The University of Newcastle (UON), Australia	1.000000	0.07
Great Bay University, China	1.000000	0.07
National Institute of Scientific Research (INRS), Canada	1.000000	0.07
Institute of Sustainability for Chemicals, Energy and Environment (ISCE2), A*STAR, Singapore	0.500000	0.03

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