Chemical vapor deposition growth of continuous monolayer antiferromagnetic CrOCl films

Journal:

Nature Communications

Published:

2025-12-17

DOI:

10.1038/s41467-025-66142-8

Affiliations:

10

Authors:

32

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Institutions	Authors	Share
Nanjing National Laboratory of Microstructures (NNLM), NJU, China	21.666667 21.666667 21.666667	0.68
Nanjing University (NJU), China	4.333333	0.14
Qufu Normal University (QFNU), China	2.000000	0.06
National University of Singapore (NUS), Singapore	2.000000	0.06
The University of Manchester (UoM), United Kingdom (UK)	1.000000	0.03
Peking University Shenzhen Graduate School (PKUSZ), China	1.000000	0.03

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