Self-aligned and self-limiting van der Waals epitaxy of monolayer MoS2 for scalable 2D electronics

Journal:

Nature Communications

Published:

2026-01-21

DOI:

10.1038/s41467-026-68320-8

Affiliations:

7

Authors:

19

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Institutions	Authors	Share
Tohoku University, Japan	5.000000	0.26
Tokyo Electron Technology Solutions, Japan	4.000000	0.21
Nagoya University, Japan	4.000000	0.21
Research Center for Electronic and Optical Materials, NIMS, Japan	2.000000	0.11
University of Tsukuba, Japan	2.000000	0.11
Research Network and Facility Services Division (RNFS), NIMS, Japan	1.000000	0.05
WPI International Center for Materials Nanoarchitectonics (WPI-MANA), NIMS, Japan	1.000000	0.05

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