Facile generation and reaction of densely trifluoromethylated alkyl radicals by dual photoredox and acid catalysis

Journal:
Chemical Communications
Published:
DOI:
10.1039/d6cc00475j
Affiliations:
3
Authors:
8
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Institutions Authors Share
Nippon Institute of Technology (NIT), Japan
5.000000
 0.63
Ochanomizu University, Japan
2.000000
 0.25
Institute of Science Tokyo (Science Tokyo), Japan
1.000000
 0.13
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