Interfacial thermal transport suppression by hydrogen insertion in an epitaxial Al/Si heterostructure

Journal:

Applied Physics Letters

Published:

2025-05-26

DOI:

10.1063/5.0253324

Affiliations:

6

Authors:

11

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Institutions	Authors	Share
Nanjing University (NJU), China	8.000000	0.73
Peking University (PKU), China	1.666667	0.15
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, China	1.333333	0.12

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