Interface quality improvement of metal/AlOxNy/AlGaN/GaN MIS-heterojunction by using alternative AlOxNy growth in PEALD system

Journal:
Applied Physics Letters
Published:
DOI:
10.1063/5.0256227
Affiliations:
6
Authors:
13
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Institutions Authors Share
Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), CAS, China
7.583333
 0.58
University of Science and Technology of China (USTC), China
4.416667
 0.34
Peking University (PKU), China
1.000000
 0.08
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