Low-damage dry etching process of Sc-Sb-Te phase-change memory film using a chlorine-based reactive atmosphere
- Journal:
- Applied Physics Letters
- Published:
- DOI:
- 10.1063/5.0256478
- Affiliations:
- 2
- Authors:
- 13
| Institutions | Authors | Share |
|---|---|---|
| Shenzhen University (SZU), China | 1.00 |