Numerical design considerations for vapor transport deposition of metal-halide perovskite thin films

Journal:
Applied Physics Letters
Published:
DOI:
10.1063/5.0259227
Affiliations:
2
Authors:
5
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Institutions Authors Share
University of Minnesota (UMN), United States of America (USA)
3.000000
 0.60
Massachusetts Institute of Technology (MIT), United States of America (USA)
2.000000
 0.40
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