Oxygen migration impact on ferroelectric evolution in Hf0.5Zr0.5O2 devices
- Journal:
- Applied Physics Letters
- Published:
- DOI:
- 10.1063/5.0266238
- Affiliations:
- 3
- Authors:
- 7
| Institutions | Authors | Share |
|---|---|---|
| National Yang Ming Chiao Tung University (NYCU), Taiwan | 0.86 | |
| National Synchrotron Radiation Research Center (NSRRC), Taiwan | 0.14 |