Low-temperature hybrid microwave annealing process for high-performance indium–tungsten oxide thin-film transistors

Journal:

Applied Physics Letters

Published:

2025-09-01

DOI:

10.1063/5.0267618

Affiliations:

2

Authors:

5

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Institutions	Authors	Share
Kwangwoon University, South Korea	2.500000	0.50
Electronics and Telecommunications Research Institute (ETRI), South Korea	2.500000	0.50

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