Robust low-temperature ferroelectric behavior of Al0.75Sc0.25N films

Journal:
Applied Physics Letters
Published:
DOI:
10.1063/5.0273865
Affiliations:
2
Authors:
9
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Institutions Authors Share
Changchun Institute of Optics, Fine Mechanics and Physics (CIOMP), CAS, China
7.500000
 0.83
University of Chinese Academy of Sciences (UCAS), China
1.500000
 0.17
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