Robust low-temperature ferroelectric behavior of Al0.75Sc0.25N films

Journal:

Applied Physics Letters

Published:

2025-08-23

DOI:

10.1063/5.0273865

Affiliations:

2

Authors:

9

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Institutions	Authors	Share
Changchun Institute of Optics, Fine Mechanics and Physics (CIOMP), CAS, China	7.500000	0.83
University of Chinese Academy of Sciences (UCAS), China	1.500000	0.17

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